OXIDE CMP SLURRY

This products is the only CMP Slurry used in CMP process made by colloidal silica in Korea. This part of production is the ACESOL - series Colloidal Silica Oxide CMP Slurry. The list of Oxide CMP Slurries include ACESOL 2580, 2012, and 1280. These ACESOL Oxcide CMP Slurries offer a complete solution for your polishing requirements based on the latest colloidal silica technology showing exceptional stability and high manufacturing reproducibility.