CMP Slurry, Wafer Polishing Slurry | ACE NANO
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Industrial applications

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This part of production is the Industrial Applications of slurries. The examples of main applications include refractory binder, coating vehicle, food additive and etc. The production models contain SILIFOG 30AK, 45AK, 20NS, Special Grade, and the Abrasive Silica. One of the production models, Abrasive Silica is the raw materialed colloidal silica that is used as a polishing slurry.
Applications Examples
Associativity Refractory binder
Ceramics, textile binder
Casting binder
Covering Coating vehicle
Paint vehicle
Treating material of Metal surface
Increase coefficient of friction Slipproofing agent of paper and textile products
Slipproofing agent of floor wax
Lubricant Film, active regulator
corpuscle Catalyst, absorbent ,Polishing slurry
electrification Antistainagent, a firebrick
cohesion , gelation Macromolecule cohesion
Protein adsorption Food additive
  SiO
(wt%)
NaO
(wt%)
pH
(at 20¡É)
Size
(nm)
Viscosity
(C.P at.25¡É)
Specific Gravity
(at 20¡É)
Appearance
SILIFOG 30AK 30.5¡¾0.5 0.3-0.5 9.5-10.5 10-20 < 13 1.21¡¾0.01 clear to
opalescent
SILIFOG 45AK 43.5¡¾0.5 0.5~0.7 9-10.5 10-20 < 20 1.315¡¾0.005 clear to
opalescent
SILIFOG 20NS 21.5¡¾1.5 < 0.05 9-10 10-20 < 10 1.13¡¾0.01 clear to
opalescent
Special Grade The particle size and Na content can be controlled by customers¡¯ requirements
Abrasive Silica We can provide the raw material is colloidal silica used as polishing slurry
(Consumerization)
30AK Solid content of SiO is 30%, wide applications in different fields
45AK Solid content of SiO is 43%, high solid content which have good stability
20NS Good stabilized by NH additives , the Na content can be controlled in minimum range