LET¡¯S BE THE BEST
2018 International Conference on Planarization/CMP Technology (ICPT 2018)
October 14-October 17, 2018
The K-Hotel, Republic of Korea
Website : http://www.cmpugm.com/icpt2018
ICPT 2018 is hosted by Korea CMP User¡¯s Group. This conference will enhance the collaboration between industry and academia, manufacturers and clients, in response to the trend of rapid development of semiconductor industry. ICPT 2018 encourages the communication and exchange of ideas and opportunities. We look forward to seeing you at ICPT 2018 and show you around the K-Hotel in Seoul, Republic of Korea.
Abstract Submission Deadline: April 27, 2018
Abstracts of original work are requested on the following topics:
Front end of line CMP Process control
Back end of line CMP Emerging technologies in CMP
Defects, reliability issues and Post CMP cleaning CMP consumables
CMP fundamentals, modeling and simulation 3D Ics/TSV applications
Equipment and metrology Alternative CMP technologies
CMP for MEMS
Submission Guidelines
Abstracts will be scored according to the originality and significance of the work as well as the quality of the information and data included. Please indicate the preference of oral or poster presentation, and the targeted topic area when submitting the abstract. Submit abstracts online, using the template provided. The deadline for submitting abstracts is April 27, 2018 . Presentation of accepted papers at the Conference must be in English.
Author Notification
Abstract should be submitted online and abstract can be submitted
from March 2, 2018. Notices of acceptance of abstract will be sent out
to authors by June 2, 2018.